High-Quality Magnetron Sputtering Targets

Saint-Gobain Coating Solutions leverages its deep expertise in materials science and process technologies to manufacture a comprehensive range of high-quality rotatable magnetron sputtering targets for demanding markets, including architectural glass, automotive glass, smart windows, thin-film photovoltaics (PV), flat panel displays, web coating, and coatings on polymer films.

Our sputtering targets deliver an optimal balance between coating performance and total cost of ownership. Their unique combination of design and material features ensures safe operation and a stable sputtering process, even at elevated power levels.

Our manufacturing capabilities allow the production of large-size rotatable targets, up to 3.9 meters in length and up to 225 mm in diameter.

Our high-quality rotatable (cylindrical) targets feature a joint-free design, including “dog-bone” profiles, and a strong indium-free bond to the backing tube. These characteristics enable high-power sputtering and allow material utilization down to the last millimeter, resulting in improved material efficiency and a lower cost of ownership compared to traditional straight cylindrical targets.

Our proprietary technologies also enable the reuse of backing tubes with minimal material waste, providing highly cost-effective solutions, particularly through our ECO-Recycling technology, applicable to molybdenum targets.

In addition to our standard and customizable thickness profiles, available in metallic, ceramic, and cermet formulations, our research and development capabilities allow us to work closely with customers to develop on-demand sputtering target formulations tailored to specific application requirements.

Mo
High-Purity Molybdenum (Mo) Targets

High-Purity Molybdenum Rotatable Target

(3N7+ pure)

Technically Advanced Magnetron Sputtering Targets

 

Features & Benefits

  • Very high purity formulation that meets the standards of the most demanding applications : FPD, PV-Thin-film , Touch screens, …. Allows to produce thin films with very low resistivity that are ideal for thin electrode layers, bus-bar layers, metal gates, TFT interconnects.
  • Available with “dog-bone” shape for optimum material usage and lower cost of ownership
  • Proprietary technology enables high-power sputtering for higher deposition rates up to 50 kW/m

 

Specification

 

Purity>99.97
Target Thicknessup to 18mm
Thickness Profilestraight or dog bone (without joints)
Maximum Lengthsup to 3.9 meters(12¾ feet)
ImpuritiesFe < 30 ppm
Ni < 10ppm
Electrical Resistivity

Measured on Target Material:
7.5 μΩ.cm

Measured on Thin Films:
19 μΩ.cm for 90 nm 
14 μΩ.cm for 120 nm
12 μΩ.cm for 200 nm

Surface FinishRmax < 10 μm and Ra < 0.8 µm
Recyclingyes with Eco-Recycling process
AZO
azo

Alumina-Doped Zinc Oxide Rotatable Target

High Performance Alumina-Doped Zinc Oxide AZO

 

Features & Benefits

  • Saint-Gobain AZO (Alumina-doped Zinc Oxide) sputtering targets are produced using a proprietary manufacturing process that ensures excellent thermal conductivity through strong bonding with the backing tube. Combined with a moderate target thickness, this enables very efficient cooling during sputtering, significantly reducing micro-arcing and nodule formation.
  • The target surface is fully continuous (no joints) and the material is fully homogeneous along the entire target length, unlike segmented sintered targets. This design provides superior process stability and highly reliable operation for the deposition of transparent and conductive oxide (TCO) layers.

 

AZO targets are optimized for:

  • Stable and repeatable sputtering processes
  • Very low arcing and micro-arcing levels
  • Non-reactive (oxygen-free) sputtering, preventing oxygen cross-contamination in multilayer stacks
  • High material utilization and optimized operating cost

 

Typical applications 

  • Transparent conductive front and back contacts in thin-film photovoltaic cells
  • Seed and buffer layers in Ag-based Low-E and solar control glass stacks
  • TCO layers for display and touch sensor structures

 

Specification

 

Thickness profile Straight or Dog‑bone  (no joints)
Target material thickness Up to 7 mm
Maximum target length 3 900 mm
Composition ZnO doped with 2wt % Al₂O₃ (lower contents available on demand) 
Purity 3N5 (≥ 99.95 %) 
Density 5,15 ±0,15 g.cm³
Electrical resistivity (measured on target) 1.10⁻³ Ω.cm (measured on target material)
Maximum sputtering power 35 kW m⁻¹ (DC, chamber cooling dependent) 
Recommended power ramp-up 0,5 kW m⁻¹.min⁻¹
Deposition rate (at 20 kW m⁻¹ DC) 130 nm.m.min⁻¹ (indicative only)
W
w

Tungsten High-Purity Rotatable Targets

(3N5+ pure)

Technically Advanced Magnetron Sputtering Targets

 

Features & Benefits

  • Very high purity formulation that meets the standards of the most demanding applications like for Electrochomic cell stacks our targets enabling high quality WO3 or HWO3 thin films
  • Available with  “dog-bone” shape for optimum material usage and lower cost of ownership
  • Continuous surface and strong bond ensuring stable operation with reduced risk of micro-arcs

 

Specification

 

Purity< 99.95%
Target Thicknessup to 15 mm
Thickness Profilestraight or dog-bone (without joints)
Maxilum Lengthup to 3.9 meters (12¾ feet)
Oxygen Content< 200 ppm
Surface FinishPolished (Ra < 3.2 µm) or Raw Surface
Si
Silicon High-Purity Rotatable Targets

Silicon High-Purity Rotatable Targets

(3N5+ pure)

Technically Advanced Magnetron Sputtering Targets

 

Features & Benefits

  • High-purity Silicon targets are suitable for  the magnetron sputtering deposition of either Pure Si thin film, Oxide SiO2 thin film, Nitride Si3N4 thin film for the most demanding applications and such as Touch Screen Display Glass (Touch sensor / Color filter), Web Coating (Si-based barrier layers on polymer films), or Flat Glass
  • applications in display (FPD, touch screens) industry, in PV-thin film, ….
  • Saint-Gobain has mastered internal stresses to yield safe, high quality targets that don’t crack during use.

 

Specification

 

Purity> 99.95%
Target Thicknessup to 9 mm
Thickness Profilestraight  or dog-bone (without joints)
Maximum Lengthup to 3.9 meters (12¾ feet)
Target Density2.20 g/cm3
Oxygen Content< 500 ppm 
Electrical Resistivity< 0.05 Ω.cm
Surface FinishRa < 0.8 µm
SiAl
Silicon High-Purity Rotatable Targets

Silicon Aluminum Rotatable Targets

(3N5+ pure)

Technically Advanced Magnetron Sputtering Targets

 

Features & Benefits

  • SiAl targets are extensively used in architectural glass, automotive glass, web coating (polymer films), and touch panel industries to produce either Si3N4 or SiO2 layers
  • Saint-Gobain has mastered internal stresses to yield safe, high quality SiAl targets that don’t crack during use
  • Suitable for both Ar+N2 mode (silicon nitride coatings) and Ar+O2 mode (SiO2 coatings)

 

Specification

 

CompositionSi-Al (90/10 wt%) can be tuned to customer needs 
Target Thickness (center)up to 16 mm
Thickness Profilestraight or dog-bone (without joints) 
Maximum Lengthup to 3.9 meters (12¾ feet) 
Target Density2.20 – 2.30 g/cm3
Oxygen Content< 500 ppm
Nitrogen Content< 100 ppm
Purity(Si + Al) > 99.8% - Higher purity on-demand
Surface FinishRa < 1.2 μm

 

 

 

TiOx
TiOx

TiOx Rotatable Targets

Technically Advanced Magnetron Sputtering Targets

 

Features & Benefits

  • Our TiOx targets are suitable for achieving high optical index layers on architectural glass, automotive glass, solar glass, polymer films coatings (web coatings). & others and are enabling anti-reflection properties on these substrates.
  • Saint-Gobain has mastered internal stresses to yield safe, high quality targets that don’t crack during use
  • Our targets have been optimized for extremely low dusting (particle release) during sputtering, cleaner operation.
  • Compatible with high power sputtering up to 35 kW/m in DC and 40 kW/m in AC or pulsed DC 

 

Specification

 

TiOx version TiOx (1.95) TiOx (1.86) 
Target Thickness (center) up to 9 mm up to 9 mm 
Thickness Profile straight or dog-bone (without joints) straight or dog-bone (without joints) 
Maximum Length up to 3.9 meters (12¾ feet) up to 3.9 meters (12¾ feet) 
Target Density 4.05 g/cm 4.0 g/cm 
Oxygen Content x value ∽ 1.95  x value ∽ 1.86  
Purity > 99.7% > 99.7% 
Electrical resistivity 2 Ω.cm  0.15 Ω.cm  
Surface Finish  Polished (Ra< 0.8 μm) or Raw surface Polished (Ra< 0.8 μm) or Raw surface 

 

Nb2Ox
Nb2Ox rotatable targets

Nb2Ox Rotatable Targets

Technically Advanced Magnetron Sputtering Targets

 

Features & Benefits

  • Our Nb2Ox targets are suitable for various applications including index matching layers in touchscreen-based displays (capacitive touchscreen), high optical index layers on architectural glass, automotive glass, solar glass, polymer films (web coatings), enabling anti-reflection properties on these substrates.
  • Saint-Gobain has mastered internal stresses to yield safe, high-quality targets that don’t crack during use.
  • Our targets have been optimized for extremely low dusting (particle release) during sputtering, enabling cleaner operation.
  • Compatible with high-power sputtering up to 35 kW/m in DC and 40 kW/m in AC or pulsed DC.

 

Specification

 

Target Thickness (center)up to 9 mm
Thickness Profilestraight or dog-bone (without joints)
Maximum Lengthup to 3.9 meters (12¾ feet)
Target Density5.10 g/cm3
Oxygen Contentx value ∽ 4.80
Purity> 99.8 % or 99.95% on-demand
Electrical resistivity0.02 Ω.cm
Surface FinishRa < 0.2 μm
 
Nb
ninb_target

Nobium High-Purity Rotatable Targets

Sputtering Targets (35N pure)

Technically Advanced Magnetron Sputtering Targets

 

Features & Benefits

  • Very high purity formulation that meets the standards of the most demanding applications such as touchscreens, electrochromic cell stacks, high optical index layers, and applications on flat glass or polymer film substrates.
  • Available with “dog-bone” shape for optimum material usage and lower cost of ownership.
  • Continuous surface and strong bond ensuring stable operation with reduced risk of micro-arcs.

 

Specification

 

Purity> 99.95 %
Target Thicknessup to 15 mm
Thickness Profilestraight or dog-bone (without joints)
Maximum Lengthup to 3.9 meters (12¾ feet)
Oxygen Content< 400 ppm
Surface FinishPolished (Ra < 3.2 µm) or Raw surface
 
Ta
Tantalum Targets

Tantalum High-Purity Rotatable Targets

Sputtering Targets (35N pure)

Technically Advanced Magnetron Sputtering Targets

 

Features & Benefits

  • Very high purity formulation that enables the deposition of advanced dielectric layers (Ta2O5) and that meets the standards of the most demanding applications such as Optics, Optoelectronics, Integrated microtechnologies, and Electrochromic glazings.
  • Available with “dog-bone” shape for optimum material usage and lower cost of ownership
  • Continuous surface and strong bond ensuring stable operation with reduced risk of micro-arcs

 

Specification

 

Purity> 99.95%
Target Thicknessup to 12 mm
Thickness Profilestraight  or dog-bone (without joints)
Maximum Lengthup to 3.9 meters (12¾ feet)
Oxygen Content< 1200 ppm
Surface FinishPolished (Ra < 3.2 µm) or Raw surface
Related Documents
Data Sheets (TDS)
TDS - AZO Sputtering Targets

Alumina-Doped Zinc Oxide – AZO Sputtering Target – Technical Data Sheet | #AZO; ZnO + 2 wt% Al₂O₃; 3N5 Purity; Rotatable Magnetron Sputtering Target

PDF | 743.16 KB
TDS - AZO Sputtering Targets
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