High-Quality Magnetron Sputtering Targets

Saint-Gobain Coating Solutions applies its deep knowledge of materials and technology to produce a range of high-quality rotatable sputtering targets for demanding markets such as architectural glass, automotive glass, smart windows, PV-thin film, Flat Panel Display, web coating, coatings on polymer films.

Our targets represent the perfect combination of high-quality coatings with optimized cost of ownership. The unique combination of features of our sputtering targets provides safe operation and a stable process even at higher sputtering power

moly-targets
Sputtering Targets
  • Our production capabilities enable us to manufacture large size rotatable targets : up to 3.9 meters long and up to 225 mm diameter.
  • Our high-quality rotatable (cylindrical) targets exhibit, no-joints even with “dog-bone” profile, and strong bond (indium-free) on the backing tube.
  • These features allow high-power sputtering and enable the user to sputter down to the last millimeter of material – meaning a better material usage and a lower cost of ownership than traditional straight cylindrical shape. 
  • Our proprietary technology also allows us to re-use backing tubes with minimal material waste for highly cost-effective solutions, in particular with our ECO-Recycling technology applicable on Molybdenum targets.

In addition to our range of standard & customizable thickness profiles, in metallic, ceramic & cermet formulations, we have the research & development capabilities to work with you to develop on-demand sputtering targets formulations. 

Mo
moly-target-cross-section

High-Purity Molybdenum Rotatable Target

(3N7+ pure)
Technically Advanced Magnetron Sputtering Targets

Features & Benefits

  • Very high purity formulation that meets the standards of the most demanding applications : FPD, PV-Thin-film , Touch screens, …. Allows to produce thin films with very low resistivity that are ideal for thin electrode layers, bus-bar layers, metal gates, TFT interconnects.
  • Available with “dog-bone” shape for optimum material usage and lower cost of ownership
  • Proprietary technology enables high-power sputtering for higher deposition rates up to 50 kW/m

Specification

Purity >99.97
Target Thickness up to 18mm
Thickness Profile straight or dog bone (without joints)
Maximum Lengths up to 3.9 meters(12¾ feet)
Impurities Fe < 30 ppm
Ni < 10ppm
Electrical Resistivity

Measured on Target Material:
7.5 μΩ.cm

Measured on Thin Films:
19 μΩ.cm for 90 nm 
14 μΩ.cm for 120 nm
12 μΩ.cm for 200 nm

Surface Finish Rmax < 10 μm and Ra < 0.8 µm
Recycling yes with Eco-Recycling process
W
W004 003

Tungsten High-Purity Rotatable Targets

(3N5 pure)
Technically Advanced Magnetron Sputtering Targets

Features & Benefits 

  • Very high purity formulation that meets the standards of the most demanding applications like for Electrochomic cell stacks our targets enabling high quality WO3 or HWO3 thin films
  • Available with  “dog-bone” shape for optimum material usage and lower cost of ownership
  • Continuous surface and strong bond ensuring stable operation with reduced risk of micro-arcs

Specifications

Purity < 99.95%
Target Thickness up to 15 mm
Thickness Profile straight or dog-bone (without joints)
Maxilum Length up to 3.9 meters (12¾ feet)
Oxygen Content < 200 ppm
Surface Finish Polished (Ra < 3.2 µm) or Raw Surface

 

Nb
ninb_target

Niobium High-Purity Rotatable Targets

(3N5 pure)
Technically Advanced Magnetron Sputtering Targets

Features & Benefits

  • Very high purity formulation that meets the standards of the most demanding applications such as Touch-Screens, Electrochromic cell stacks, high optical index layers, and can be applied on Flat Glass or Polymer films substrates.
  • Available with “dog-bone” shape for optimum material usage and lower cost of ownership
  • Continuous surface and strong bond ensuring stable operation with reduced risk of micro-arcs

Specification

Purity > 99.95 % 
Target Thickness up to 15 mm
Thickness Profile straight or dog-bone (without joints)
Maximum Length up to 3.9 meters (12¾ feet)
Oxygen Content < 400 ppm
Surface Finish Polished (Ra < 3.2 µm) or Raw surface
Ta
Tantalum High-Purity Rotatable Targets

Tantalum High-Purity Rotatable Targets

(3N5 pure)
Technically Advanced Magnetron Sputtering Targets

Features & Benefits

  • Very high purity formulation that enables the deposition of advanced dielectric layers (Ta2O5) and that meets the standards of the most demanding applications such as Optics, Optoelectronics, Integrated microtechnologies, and Electrochromic glazings.
  • Available with “dog-bone” shape for optimum material usage and lower cost of ownership
  • Continuous surface and strong bond ensuring stable operation with reduced risk of micro-arcs

Specifications

Purity > 99.95%
Target Thickness up to 12 mm
Thickness Profile straight  or dog-bone (without joints)
Maximum Length up to 3.9 meters (12¾ feet)
Oxygen Content < 1200 ppm
Surface Finish Polished (Ra < 3.2 µm) or Raw surface
Si
magica pictures for TiOx, Mo, Nb, SiAl, Si

Silicon High-Purity Rotatable Targets

(3N5+ pure)
Technically Advanced Magnetron Sputtering Targets

Features & Benefits

  • High-purity Silicon targets are suitable for  the magnetron sputtering deposition of either Pure Si thin film, Oxide SiO2 thin film, Nitride Si3N4 thin film for the most demanding applications and such as Touch Screen Display Glass (Touch sensor / Color filter), Web Coating (Si-based barrier layers on polymer films), or Flat Glass
  • applications in display (FPD, touch screens) industry, in PV-thin film, ….
  • Saint-Gobain has mastered internal stresses to yield safe, high quality targets that don’t crack during use.

Specifications

Purity > 99.95%
Target Thickness up to 9 mm
Thickness Profile straight  or dog-bone (without joints)
Maximum Length up to 3.9 meters (12¾ feet)
Target Density 2.20 g/cm3
Oxygen Content < 500 ppm 
Electrical Resistivity < 0.05 Ω.cm
Surface Finish Ra < 0.8 µm
SiAl
magica pictures for TiOx, Mo, Nb, SiAl, Si

Silicon-Aluminum Rotatable Targets 

Technically Advanced Magnetron Sputtering Targets

Features & Benefits

  • SiAl targets are extensively used in architectural glass, automotive glass, web coating (polymer films), and touch panel industries to produce either Si3N4 or SiO2 layers
  • Saint-Gobain has mastered internal stresses to yield safe, high quality SiAl targets that don’t crack during use
  • Suitable for both Ar+N2 mode (silicon nitride coatings) and Ar+O2 mode (SiO2 coatings)

Specifications

Composition Si-Al (90/10 wt%) can be tuned to customer needs 
Target Thickness (center) up to 16 mm
Thickness Profile straight or dog-bone (without joints) 
Maximum Length up to 3.9 meters (12¾ feet) 
Target Density 2.20 – 2.30 g/cm3
Oxygen Content < 500 ppm
Nitrogen Content < 100 ppm
Purity (Si + Al) > 99.8% - Higher purity on-demand
Surface Finish Ra < 1.2 μm
TiOx
TiOx rotatable targets

TiOX Rotatable Targets 

Technically Advanced Magnetron Sputtering Targets

Features & Benefits

  • Our TiOx targets are suitable for achieving high optical index layers on architectural glass, automotive glass, solar glass, polymer films coatings(, web coatings). & others and are enabling anti-reflection properties on these substrates. 

  • Saint-Gobain has mastered internal stresses to yield safe, high quality targets that don’t crack during use 

  • Our targets have been optimized for extremely low dusting (particle release) during sputtering, cleaner operation. 

  • Compatible with high power sputtering up to 35 kW/m in DC and 40 kW/m in AC or pulsed DC 

Specifications

TiOx version  TiOx (1.95)  TiOx (1.86) 
Target Thickness (center)  up to 9 mm  up to 9 mm 
Thickness Profile  straight or dog-bone (without joints)  straight or dog-bone (without joints) 
Maximum Length  up to 3.9 meters (12¾ feet)  up to 3.9 meters (12¾ feet) 
Target Density  4.05 g/cm  4.0 g/cm 
Oxygen Content  x value ∽ 1.95   x value ∽ 1.86  
Purity  > 99.7%  > 99.7% 
Electrical resistivity  2 Ω.cm   0.15 Ω.cm  
Surface Finish   Polished (Ra< 0.8 μm) or Raw surface  Polished (Ra< 0.8 μm) or Raw surface 
Nb2Ox
Nb2Ox rotatable targets

Nb2OX Rotatable Targets

Technically Advanced Magnetron Sputtering Targets

Features & Benefits

  • Our Nb2Ox targets are suitable for various applications including Index matching layer in Touchscreen-based Display (capacitive touchscreen), high optical index layers on architectural glass, automotive glass, solar glass, polymer films (web coatings).and are enabling anti-reflection properties on these substrates. 

  • Saint-Gobain has mastered internal stresses to yield safe, high quality targets that don’t crack during use 

  • Our targets have been optimized for extremely low dusting (particle release) during sputtering, cleaner operation. 

  • Compatible with high power sputtering up to 35 kW/m in DC and 40 kW/m in AC or pulsed DC 

Specifications

Target Thickness (center) up to 9 mm
Thickness Profile straight or dog-bone (without joints)
Maximum Length up to 3.9 meters (12¾ feet) 
Target Density 5.10 g/cm3 
Oxygen Content x value ∽ 4.80 
Purity > 99.8 % or 99.95% on-demand
Electrical resistivity 0.02 Ω.cm
Surface Finish Ra < 0.2 μm